Electron-Beam Evaporation System

Electron-Beam Evaporation System Leybold, A700QE Usage Modus Operandi:Service-Mode Contamination category:C Sample-size:100 mm, 150 mm Wafer FOM-Name and Location FOM-Name:- Box Coater Leybold A700QE (Electron-Beam) Location:ZMNT, Room 007 Resources Tool manager: Jochen Heiss Instruction video: Not available Tool description:Materials: Au, Cr, Ti, Cu, Al, on demand

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Sputtering System

Sputtering System Nordiko, NS 2550 Duisburg Usage Modus Operandi:Service-Mode Contamination category:C Sample-size:100 mm, 150 mm Wafer FOM-Name and Location FOM-Name:- Nordiko (Duisburg) Location:ZMNT, Room 007 Resources Tool manager: Jochen Heiss Instruction video: Not available Tool description:Targets: Ti, Pl, Iridium, on demand

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Sputtering System

Sputtering System Nordiko, NS 2550 Berlin Usage Modus Operandi:Service-Mode Contamination category:C Sample-size:100 mm, 150 mm Wafer FOM-Name and Location FOM-Name:- Nordiko (Berlin) Location:ZMNT, Room 007 Resources Tool manager: Jochen Heiss Instruction video: Not available Tool description: Targets: Ti, Au, changing, on demand

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Electron-Beam and Thermal Evaporation System

Electron-Beam and Thermal Evaporation System Pfeiffer Vacuume, Classic 580 Usage Modus Operandi:Service-Mode Contamination category:C Sample-size:4″-, 5″- and 6″-wafers; sample size up to 6″ FOM-Name and Location FOM-Name:- AMO – Evaporator Location:AMO Resources Tool manager: AMO Instruction video: Not available Tool description: 6″ e-beam and resistive evaporator; Materials: Al, Cr, SiO2, Ti, Ta2O5, etc.; process gases: […]

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E-Beam and Thermal Evaporator with Sputter Target

Electron-Beam Evaporation, Thermal Evaporation and Sputtering System CREAVAC Usage Modus Operandi:User-mode Contamination category: C Sample-size:Pieces … 4″ FOM-Name and Location FOM-Name:E-Beam and Thermal Evaporator Location:CMNT, Room 002 Resources Tool manager: Natalie Bruger Instruction video: Open video Tool description: 7 x 7 cm3 e-beam evaporator crucibles (8 keV), 2 thermal evaporators (2 kW), 1 DC sputter source,Ar milling, base pressure: 5 x 10-8 mbar, […]

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