Electron-Beam Lithography System

Electron-Beam Lithography System Vistec, EBPG 5200 Usage Modus Operandi:Service-Mode Contamination category:B and C (dedicated holder) Sample-size:from samples of 10×10 mm² up to 8″ wafers FOM-Name and Location FOM-Name:- AMO – E-Beam Litho (Vistec EBPG 5200) Location:AMO Resources Tool manager: AMO Instruction video: Not available Tool description: E-Beam lithography tool; 50/100 kV; sub 10 nm resolution

Read More

E-Beam Lithography (eLINE)

Electron-Beam Lithography System RAITH, eLINE Usage Modus Operandi:User-mode Contamination category: B, C Sample-size:Pieces … 4″ FOM-Name and Location FOM-Name:- Physik – E-Beam Litho (Raith eLINE) Location:Physikzentrum, Room 28A315 Resources Tool manager: Lars Schreiber Instruction video: Open video Tool description: Raith, eLINE

Read More

Wet Benches Solvents, Resists, Developers

Wet Benches for Solvents, Resists and Developers Usage Modus Operandi:User-mode Contamination category: C Sample-size:Pieces … 4″ FOM-Name and Location FOM-Name: – Physik – Wet Benches Location: Physikzentrum, Room 28A313 Resources Tool manager:Natalie Bruger Instruction video:Open video Tool description:Three wet benches for solvents (isopropanol, acetone), resists (incl. spinner and hotplates) and developers.

Read More

Electron-Beam Lithography (RAITH150 Two)

Electron Beam Lithography System Raith,  RAITH150 Two Usage Modus Operandi:User-mode Contamination category: A,B,C if appropriate chucks are used Sample-size:Pieces … 6″ wafers FOM-Name and Location FOM-Name:– IHT – E-Beam Litho (RAITH150 Two) Location:WSH, Room 24B102 Resources Tool manager: Birger Berghoff Instruction video: Tool description:

Read More