Atomic Layer Deposition Tool

Atomic Layer Deposition Tool Oxford Instruments, FlexAL Usage Modus Operandi:Service-Mode Contamination category:C Sample-size:up to 8″ wafers; 8″ dummy wafer for samples FOM-Name and Location FOM-Name:- AMO – ALD Location:AMO Resources Tool manager: AMO Instruction video: Not available Tool description: Materials: AlN, Al2O3, TaN, TiN; process gases: N2, H2, O2, SF6, Ar, NH3, H2O; Wafer stage […]

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Clustertool (ALD+ICP-CVD)

Cluster Tool for Atomic Layer Deposition and Inductively Coupled Plasma Chemical Vapor Deposition Oxford Instruments, PlasmalabSystem 100 Usage Modus Operandi:User-mode Contamination category: B Sample-size:Pieces … 6″ wafers,8″ wafer possible with small modifications FOM-Name and Location FOM-Name:– IHT – Cluster-Tool (ALD and ICP-CVD) Location:WSH, Room 24B101 Resources Tool manager: Birger Berghoff Instruction video: Open video Tool […]

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