Atomic Layer Deposition Tool

Oxford Instruments, FlexAL Modus Operandi:Service-ModeContamination category:CSample-size:up to 8″ wafers; 8″ dummy wafer for samples FOM-Name:- AMO – ALDLocation:AMO Tool manager: AMO Instruction video: Not available Tool description: Materials: AlN, Al2O3, TaN, TiN; process gases: N2, H2, O2, SF6, Ar, NH3, H2O; Wafer stage temperature up to 400°C

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Clustertool (ALD+ICP-CVD)

Oxford Instruments, PlasmalabSystem 100 Modus Operandi:User-modeContamination category: BSample-size:Pieces … 6″ wafers,8″ wafer possible with small modifications FOM-Name:– IHT – Cluster-Tool (ALD and ICP-CVD)Location:WSH, Room 24B101 Tool manager: Birger Berghoff Instruction video: Open video Tool description: Oxford Instruments, PlasmalabSystem 100

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