Photolithography System (Mask Aligner)

Photolithography System (Mask Aligner) SÜSS MicroTec, MA6 Usage Modus Operandi:Service-Mode Contamination category:C Sample-size:100 mm, 150 mm Wafer FOM-Name and Location FOM-Name:- Mask Aligner MA 6 Location:ZMNT, Room 009 Resources Tool manager: Jochen Heiss Instruction video: Not available Tool description: Mask Aligner and Bond Aligner, UV NIL Tooling

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Wet Bench for Imprint Processes

Wet Bench for Imprint Processes Arias Usage Modus Operandi:Service-Mode Contamination category:B and C (dedicated halves) Sample-size:pieces – 8″ wafers FOM-Name and Location FOM-Name:- AMO – Went Bench Imprint Location:AMO Resources Tool manager: AMO Instruction video: Not available Tool description: wet bench right (class C), carrier left (class B)

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