ICP-RIE (Fluorian)

Joachim Knoch Available Processing Tools, Dry Etching

Inductively Coupled Plasma Reactive-Ion Etcher

SENTECH, ICP-RIE SI 500

Usage

  • Modus Operandi:
    ...
  • Contamination category: C
  • Sample-size:
    Pieces ... 4″
ICP-RIE Reactive Ion Etching

FOM-Name and Location

  • FOM-Name:
    ICP-RIE (Fluorian)
  • Location:
    CMNT, Room 004

Resources

  • Tool manager:
    Jan Gruis
  • Instruction video:
    Open video
  • Tool description:
    SENTECH ICP-RIE SI500
    Flourine-based process gases