Chemical Vapor Deposition

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  • Low Pressure Chemical Vapour Deposition Furnace for Low Temperature Silicon Dioxide

    Centrotherm

    Usage

    • Modus Operandi:
      Service-Mode
    • Contamination category:
      A
    • Sample-size:
      up to 25 wafers per run; 9 samples (max. 2x2 cm)

    FOM-Name and Location

    • FOM-Name:
      - AMO - LPCVD-LTO
    • Location:
      AMO

    Resources

    • Tool manager:
      AMO
    • Instruction video:
      Not available
    • Tool description:
      LTO (low temp. SiO2); 425°C; SiH4 and O2 process; up to 500 nm
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  • Low Pressure Chemical Vapour Deposition Furnace for Polycrystalline Silicon

    Centrotherm

    Usage

    • Modus Operandi:
      Service-Mode
    • Contamination category:
      A
    • Sample-size:
      up to 25 wafers per run; 15x15 cm tray for samples

    FOM-Name and Location

    • FOM-Name:
      - AMO - LPCVD-Poly
    • Location:
      AMO

    Resources

    • Tool manager:
      AMO
    • Instruction video:
      Not available
    • Tool description:
      Polysilicon; 620°C; SiH4 process; up to 500 nm
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  • Plasma-Enhanced Chemical Vapor Deposition System

    Oxford Instruments, PlasmaLab 80 Plus

    Usage

    • Modus Operandi:
      ...
    • Contamination category: C
    • Sample-size:
      Pieces ... 4″
    Oxford PlasmaLab 80 PECVD

    FOM-Name and Location

    • FOM-Name:
      PECVD (Petzi)
    • Location:
      CMNT, Room 004

    Resources

    • Tool manager:
      Jan Gruis
    • Instruction video:
      Open video
    • Tool description:
      Oxford Instruments, PlasmaLab 80 Plus
      Parallel-plate PECVD
      Process gases: SiH4, O2, NH3
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  • Cluster Tool for Atomic Layer Deposition and Inductively Coupled Plasma Chemical Vapor Deposition

    Oxford Instruments, PlasmalabSystem 100

    Usage

    • Modus Operandi:
      User-mode
    • Contamination category: B
    • Sample-size:
      Pieces ... 6″ wafers,
      8" wafer possible with small modifications
    Oxford Clustertool, ALD – ICP-PECVD

    FOM-Name and Location

    • FOM-Name:
      – IHT – Cluster-Tool (ALD and ICP-CVD)
    • Location:
      WSH, Room 24B101

    Resources

    • Tool manager:
      Birger Berghoff
    • Instruction video:
      Open video
    • Tool description:
      Oxford Instruments, PlasmalabSystem 100
    Continue reading →

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