Atomic Layer Deposition

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  • Atomic Layer Deposition Tool

    Oxford Instruments, FlexAL

    Usage

    • Modus Operandi:
      Service-Mode
    • Contamination category:
      C
    • Sample-size:
      up to 8" wafers; 8" dummy wafer for samples

    FOM-Name and Location

    • FOM-Name:
      - AMO - ALD
    • Location:
      AMO

    Resources

    • Tool manager:
      AMO
    • Instruction video:
      Not available
    • Tool description:
      Materials: AlN, Al2O3, TaN, TiN; process gases: N2, H2, O2, SF6, Ar, NH3, H2O; Wafer stage temperature up to 400°C
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  • Cluster Tool for Atomic Layer Deposition and Inductively Coupled Plasma Chemical Vapor Deposition

    Oxford Instruments, PlasmalabSystem 100

    Usage

    • Modus Operandi:
      User-mode
    • Contamination category: B
    • Sample-size:
      Pieces ... 6″ wafers,
      8" wafer possible with small modifications
    Oxford Clustertool, ALD – ICP-PECVD

    FOM-Name and Location

    • FOM-Name:
      – IHT – Cluster-Tool (ALD and ICP-CVD)
    • Location:
      WSH, Room 24B101

    Resources

    • Tool manager:
      Birger Berghoff
    • Instruction video:
      Open video
    • Tool description:
      Oxford Instruments, PlasmalabSystem 100
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