Nanoimprint Lithography

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  • Photolithography System (Mask Aligner)

    SÜSS MicroTec, MA6

    Usage

    • Modus Operandi:
      Service-Mode
    • Contamination category:
      C
    • Sample-size:
      100 mm, 150 mm Wafer

    FOM-Name and Location

    • FOM-Name:
      - Mask Aligner MA 6
    • Location:
      ZMNT, Room 009

    Resources

    • Tool manager:
      Jochen Heiss
    • Instruction video:
      Not available
    • Tool description:
      Mask Aligner and Bond Aligner, UV NIL Tooling
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  • Wet Bench for Imprint Processes

    Arias

    Usage

    • Modus Operandi:
      Service-Mode
    • Contamination category:
      B and C (dedicated halves)
    • Sample-size:
      pieces - 8" wafers

    FOM-Name and Location

    • FOM-Name:
      - AMO - Went Bench Imprint
    • Location:
      AMO

    Resources

    • Tool manager:
      AMO
    • Instruction video:
      Not available
    • Tool description:
      wet bench right (class C), carrier left (class B)
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  • SCIL UV Nanoimprint Lithography System

    SÜSS MicroTec, MA8 Gen3

    Usage

    • Modus Operandi:
      Service-Mode
    • Contamination category:
      B
    • Sample-size:
      2" - 8" wafers

    FOM-Name and Location

    • FOM-Name:
      - AMO - SCIL UV Nanoimprint
    • Location:
      AMO

    Resources

    • Tool manager:
      AMO
    • Instruction video:
      Not available
    • Tool description:
      SCIL 2″-8″ UV-Nanoimprint Lithography
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  • Soft UV Nanoimprint Lithography Prototype System

    EVG, 620

    Usage

    • Modus Operandi:
      Service-Mode
    • Contamination category:
      B
    • Sample-size:
      4"- 6" flexible template size

    FOM-Name and Location

    • FOM-Name:
      - AMO - Soft UV Nanoimprint
    • Location:
      AMO

    Resources

    • Tool manager:
      AMO
    • Instruction video:
      Not available
    • Tool description:
      Soft UV Nanoimprint prototype
    Continue reading →

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