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Soft UV Nanoimprint Lithography Prototype System
EVG, 620
Usage
- Modus Operandi:
Service-Mode - Contamination category:
B - Sample-size:
4"- 6" flexible template size
FOM-Name and Location
- FOM-Name:
- AMO - Soft UV Nanoimprint - Location:
AMO
Resources
- Tool manager:
AMO - Instruction video:
Not available - Tool description:
Soft UV Nanoimprint prototype
- Modus Operandi:
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Sputtering System
Nordiko, NS 2550 Berlin
Usage
- Modus Operandi:
Service-Mode - Contamination category:
C - Sample-size:
100 mm, 150 mm Wafer
FOM-Name and Location
- FOM-Name:
- Nordiko (Berlin) - Location:
ZMNT, Room 007
Resources
- Tool manager:
Jochen Heiss - Instruction video:
Not available - Tool description:
Targets: Ti, Au, changing, on demand
- Modus Operandi:
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Sputtering System
Nordiko, NS 2550 Duisburg
Usage
- Modus Operandi:
Service-Mode - Contamination category:
C - Sample-size:
100 mm, 150 mm Wafer
FOM-Name and Location
- FOM-Name:
- Nordiko (Duisburg) - Location:
ZMNT, Room 007
Resources
- Tool manager:
Jochen Heiss - Instruction video:
Not available - Tool description:
Targets: Ti, Pl, Iridium, on demand
- Modus Operandi:
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Wafer Bonder
SÜSS MicroTec, SB6e
Usage
- Modus Operandi:
User-mode - Contamination category: B,C if appropriate handling tools are used
- Sample-size:
6″ wafers
FOM-Name and Location
- FOM-Name:
N.N. - Location:
CMNT, Room 006
Resources
- Tool manager:
Jochen Heiss - Instruction video:
Open video - Tool description:
SÜSS MicroTec, SB6e
- Modus Operandi:
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Wet Bench for Imprint Processes
Arias
Usage
- Modus Operandi:
Service-Mode - Contamination category:
B and C (dedicated halves) - Sample-size:
pieces - 8" wafers
FOM-Name and Location
- FOM-Name:
- AMO - Went Bench Imprint - Location:
AMO
Resources
- Tool manager:
AMO - Instruction video:
Not available - Tool description:
wet bench right (class C), carrier left (class B)
- Modus Operandi:
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Wet Bench for Lithography Processes
Arias
Usage
- Modus Operandi:
Service-Mode - Contamination category:
B - Sample-size:
wide range of sample and wafer sizes up to 8"
FOM-Name and Location
- FOM-Name:
- AMO - Wet Bench Lithography - Location:
AMO
Resources
- Tool manager:
AMO - Instruction video:
Not available - Tool description:
Single wafer, batch and samples; cleaning and resist processes
- Modus Operandi:
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Wet Bench for Resist Coating
Arias
Usage
- Modus Operandi:
User-Mode - Contamination category:
C - Sample-size:
100 mm, 150 mm Wafer
FOM-Name and Location
- FOM-Name:
- Litho-Bench 1 - Location:
ZMNT, Room 009
Resources
- Tool manager:
Jochen Heiss - Instruction video:
Not available - Tool description:
Hotplate small, medium, big (Gestigkeit), Spin Coater RC8 (SÜSS MicroTec, RC8 )
- Modus Operandi:
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Wet Bench for Resist Coating and Development
Arias
Usage
- Modus Operandi:
User-Mode - Contamination category:
C - Sample-size:
100 mm, 150 mm Wafer
FOM-Name and Location
- FOM-Name:
- Litho-Bench 2 - Location:
ZMNT, Room 009
Resources
- Tool manager:
Jochen Heiss - Instruction video:
Not available - Tool description:
Hotplate small, medium, big (Gestigkeit), Spin Coater (Sawatec, SM 180)
- Modus Operandi:
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Wet Bench for Standard Cleaning (RCA)
Arias
Usage
- Modus Operandi:
Service-Mode - Contamination category:
A - Sample-size:
dedicated holder for 2x2 cm2 and 3x3 cm2; 4", 5", 6", 8" wafers
FOM-Name and Location
- FOM-Name:
- AMO - Wet Bench RCA - Location:
AMO
Resources
- Tool manager:
AMO - Instruction video:
Not available - Tool description:
Single wafer and batch; cleaning processes
- Modus Operandi:
- Continue reading →
Wet Bench Fume Hood
Arias
Usage
- Modus Operandi:
User-mode - Contamination category: A,B (right side),C (left side) if appropriate labware and beakers are used
- Sample-size:
Pieces ... 6″ wafers
FOM-Name and Location
- FOM-Name:
Wet Bench Fume Hood - Location:
CMNT, Room 001
Resources
- Tool manager:
Birger Berghoff - Instruction video:
Open video - Tool description:
- Modus Operandi:
Back to overview of tools.