Wet Chemical Processing

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  • Wet Bench for Resist Coating and Development

    Arias

    Usage

    • Modus Operandi:
      User-Mode
    • Contamination category:
      C
    • Sample-size:
      100 mm, 150 mm Wafer

    FOM-Name and Location

    • FOM-Name:
      - Litho-Bench 2
    • Location:
      ZMNT, Room 009

    Resources

    • Tool manager:
      Jochen Heiss
    • Instruction video:
      Not available
    • Tool description:
      Hotplate small, medium, big (Gestigkeit), Spin Coater (Sawatec, SM 180)
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  • Wet Bench for Resist Coating

    Arias

    Usage

    • Modus Operandi:
      User-Mode
    • Contamination category:
      C
    • Sample-size:
      100 mm, 150 mm Wafer

    FOM-Name and Location

    • FOM-Name:
      - Litho-Bench 1
    • Location:
      ZMNT, Room 009

    Resources

    • Tool manager:
      Jochen Heiss
    • Instruction video:
      Not available
    • Tool description:
      Hotplate small, medium, big (Gestigkeit), Spin Coater RC8 (SÜSS MicroTec, RC8 )
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  • Wet Bench for Standard Cleaning (RCA)

    Arias

    Usage

    • Modus Operandi:
      Service-Mode
    • Contamination category:
      A
    • Sample-size:
      dedicated holder for 2x2 cm2 and 3x3 cm2; 4", 5", 6", 8" wafers

    FOM-Name and Location

    • FOM-Name:
      - AMO - Wet Bench RCA
    • Location:
      AMO

    Resources

    • Tool manager:
      AMO
    • Instruction video:
      Not available
    • Tool description:
      Single wafer and batch; cleaning processes
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  • Wet Bench for Lithography Processes

    Arias

    Usage

    • Modus Operandi:
      Service-Mode
    • Contamination category:
      B
    • Sample-size:
      wide range of sample and wafer sizes up to 8"

    FOM-Name and Location

    • FOM-Name:
      - AMO - Wet Bench Lithography
    • Location:
      AMO

    Resources

    • Tool manager:
      AMO
    • Instruction video:
      Not available
    • Tool description:
      Single wafer, batch and samples; cleaning and resist processes
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  • Wet Bench for Imprint Processes

    Arias

    Usage

    • Modus Operandi:
      Service-Mode
    • Contamination category:
      B and C (dedicated halves)
    • Sample-size:
      pieces - 8" wafers

    FOM-Name and Location

    • FOM-Name:
      - AMO - Went Bench Imprint
    • Location:
      AMO

    Resources

    • Tool manager:
      AMO
    • Instruction video:
      Not available
    • Tool description:
      wet bench right (class C), carrier left (class B)
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  • Wet Benches for Solvents, Resists and Developers

    Usage

    • Modus Operandi:
      User-mode
    • Contamination category: C
    • Sample-size:
      Pieces ... 4″
    Physik Wetbenches

    FOM-Name and Location

    • FOM-Name:
      - Physik - Wet Benches
    • Location:
      Physikzentrum, Room 28A313

    Resources

    • Tool manager:
      Natalie Bruger
    • Instruction video:
      Open video
    • Tool description:
      Three wet benches for solvents (isopropanol, acetone), resists (incl. spinner and hotplates) and developers.
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  • Wet Bench for Solvents and Resist Development

    Arias

    Usage

    • Modus Operandi:
      User-mode
    • Contamination category: A, B
    • Sample-size:
      Pieces ... 6″ wafers
    Wet Bench for Solvents and Resist Development

    FOM-Name and Location

    • FOM-Name:
      Wet Bench Solvents and Resist Development
    • Location:
      CMNT, Room 001

    Resources

    • Tool manager:
      Birger Berghoff
    • Instruction video:
      Open video
    • Tool description: 
    Continue reading →
  • Wet Bench Fume Hood

    Arias

    Usage

    • Modus Operandi:
      User-mode
    • Contamination category: A,B (right side),C (left side) if appropriate labware and beakers are used
    • Sample-size:
      Pieces ... 6″ wafers
    Acid Hood

    FOM-Name and Location

    Resources

    • Tool manager:
      Birger Berghoff
    • Instruction video:
      Open video
    • Tool description: 
    Continue reading →
  • Single-Wafer Cleaning System

    acp, Corwet 200M

    Usage

    • Modus Operandi:
      User-mode
    • Contamination category: A, B
    • Sample-size:
      4″ wafers only
    Single Wafer Cleaning

    FOM-Name and Location

    Resources

    Continue reading →
  • Wet Bench for Standard Cleaning (RCA)

    Arias

    Usage

    • Modus Operandi:
      User-mode
    • Contamination category: A, B
    • Sample-size:
      Pieces ... 8″ wafers
    Wet Bench Standard Clean (RCA)

    FOM-Name and Location

    Resources

    • Tool manager:
      Birger Berghoff
    • Instruction video:
      Open video
    • Tool description:
    Continue reading →

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